The National Cybersecurity Center of Excellence (NCCoE), along with the SEMI Semiconductor Manufacturing Cybersecurity Consortium, has released for public comment the draft of NIST Internal Report (NIST IR) 8546, Cybersecurity Framework (CSF) 2.0 Semiconductor Manufacturing Community Profile.
The public comment period for this draft has been extended until 11:59 p.m. EDT on May 30, 2025. All comments received by then will be reviewed and adjudicated to inform the final publication.
The Draft NIST Internal Report (IR) 8546, Cybersecurity Framework 2.0 Semiconductor Manufacturing Community Profile, provides a voluntary, risk-based approach for managing cybersecurity activities and reducing cybersecurity risk to semiconductor manufacturing. The semiconductor manufacturing environment is a complex ecosystem of device makers, original equipment manufacturers, suppliers, and solution providers. This Profile focuses on desired cybersecurity outcomes and can be used as a guideline to improve the current cybersecurity posture of the semiconductor manufacturing ecosystem.
The Cybersecurity Framework Profile for Semiconductor Manufacturing Public Workshop on March 13, 2025 is now available on the NCCoE event page.
